Semiconductor & Nano Fab Center
MIMOS SEMICONDUCTOR second facility, Fab 2, produces 200mm wafers at medium volume capacity. Our operation is backed by robust technologies from IMS Germany and NTT Japan.
The 200mm wafer fabrication plant is fully-equipped with industry-standard technology as well as machinery, to cater to various industrial and research requirements. We are able to provide a wide range of services including Design Support, Customized Processes, Multi-Project Wafer (MPW) programmes and Product Development & Fabrication in CMOS, HVMOS, Digital, Analog and Microelectromechanical Systems (MEMS) technology platforms